2 December 2021Repair ultra-small defects. With low energy technology for highest resolution.ZEISS MeRiT LEwww.zeiss.com/mask-repairThe next generation MeRiT® system repairs high-end photomasks, addressing 5 nm technology node and beyond with a focus on EUV repairs. The column is based on proven ZEISS technology. It is optimized for lowest beam energies enabling repair of ultra-small defect sizes down to 10 nm.Successful EUV repair verified by AIMSTM EUV.Pre repair SEM image Post repair SEM image Defect type: Bridge defect 60 nm Half Pitch on programmed defect maskAIMSTM EUV imagesmt01 anzeige merit le 1.indd 121.01.21 09:13
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